Chemical Vapour Deposition 1600^oC

VBCC Lite‐Chemical Vapour Deposition

The VBCC Lite Chemical Vapor Deposition (CVD) system is a sophisticated, high-performance solution for thin film applications, suitable for research and industrial use. This system is engineered to deliver precise, reliable results for applications including dielectrics, conductors, passivation layers, oxidation barriers, conductive oxides, tribological and corrosion-resistant coatings, heat-resistant coatings, and epitaxial layers for microelectronics.

The furnace structure of the VBCC Lite CVD system is built with high-quality materials, featuring a tubular furnace design with a size of approximately 600(W) x 600(D) x 1400(H) mm. The insulation is robust, capable of withstanding temperatures up to 1800°C and continuous operation at 1700°C. The furnace incorporates ultra‐low thermal conductivity insulation, ensuring energy efficiency by consuming only 50% of the power used by conventional furnaces.

The heating system utilizes world-class imported heating elements which ensures precise heating up to 1800°C. The rapid heating rate ranges from 1 to 5 degrees per minute, and the placement of heating elements ensures temperature uniformity across the alumina tube.

For control, the system is equipped with a TAIE microprocessor‐based digital PID controller, allowing precise temperature management. The power supply is facilitated through a power isolation transformer, and the system includes comprehensive safety features such as interlocks, alarms, and emergency shutdown mechanisms to safeguard both equipment and personnel.

The VBCC Lite CVD system excels in vacuum and gas handling, with a vacuum capacity reaching up to 10̂ ‐6 mbar. It features mass flow controllers from Aalborg, USA, ensuring precise gas control and efficient gas purging. The alumina working tube, with a purity of 99.8% and zero porosity, measures approximately 100 (ID) x 110 (OD) x 1000 (L) mm, providing a reliable environment for high‐temperature operations.The furnace maintains a low skin temperature due to its double‐wall structure and special air circulation system, ensuring safe operation and minimal heat loss.

The water cooling system includes a chiller unit with a 50‐liter capacity, automatic temperature control, and a circulation rate of 20 liters per minute. This system ensures optimal cooling of the stainless steel fittings and the alumina tube, maintaining the integrity of the vacuum and gas purging processes.

In terms of user experience, the VBCC Lite CVD system offers both manual control via a control panel and automated control through SCADA software. The SCADA software facilitates programming, monitoring, data retrieval, and comprehensive management of the entire system. This integration allows users to perform advanced research with ease and precision, making the VBCC Lite CVD system an invaluable tool for cutting‐edge thin film deposition.

With its advanced features, energy efficiency, and user-friendly operation, the VBCC Lite CVD system stands out as a premier choice for researchers and industrial users aiming to achieve high‐quality and reliable thin film deposition processes.

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