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Research Institutions > Research Institutions- Equipments > Chemical Vapour Deposition 1200oC
Chemical Vapour Deposition 1200oC
- Working Temperature up to RT to 1800oC
- Tailor made Tub size as per the customer requirement
- Three Zone type
- Kanthal / SiC / Molybdenum di silicide heating elements from Sweden / USA
- Imported recrystallized aulumina tube from Hallden Wanger Germany
- 1oC accuracy at dwell temp
- Rapid heating rate(1 to 20oC/min) programmable
- Suitable for nanotechnology applications
- Indigenously developed suseptor for reliable heat generation
- Imported / indigenized Insulation
- Indigenous VBCC Make phase control thyrister controller
- Nippon / Eurotherm PID programmable digital temperature indicator cum controller
- Controlled atmosphere
- Gas parging (Mass Flow Controller Rotometer)
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